Unitemp **退火炉/真空退火炉 VPO-1000-300

VPO-1000-300 Vacuum Process Oven
真空退火炉
Field of application 应用:
for wafer processes, like 用于晶圆工艺过程，比如:
? Annealing 退火处理
? SiAu, SiAl, SiMo alloying 材料合金融合
? Low-k electrics 低K值电子元件
? post implanting annealing 离子注入并退火
? copper paste firing 炼制铜浆
? resistor paste firing 炼制电阻浆
? LTO (low-temperature oxidation) 低温氧化
? Solar Cell Processing 太阳能电池加工

For sizes 支持尺寸:
? 300 mm wafer size 较大支持300mm 12英寸晶圆大小
? or for 4 pcs solar cells with 156 mm dia each 或者较大可支持一次放4片156毫米太阳能电池晶片

Features特点:
? gas sealed lamp area and quartz plates 加热灯区域气体密封并且采用石英板
? excellent temperature uniformity ± 1% K 良好的温度一致性 ±1%K
? up to 1000 ° C temperature 较高支持 1000℃ 温度
? top and bottom heating by crossed lamp area field **部和底部采用交叉加热灯设计
? up to 10-3 mbar vacuum (optional up to 10-6 mbar) 较高支持10-3 mbar 真空（更高可选配10-6mbar）
? for integration into an automatically line – served by robotics (optional) 可集成到自动化产线-可选配机器人配件